如何檢測鹽酸 、硫酸中奈米顆粒的汙染物

Phoenix, AZ - October 30, 2024 – Kanomax FMT, Inc. is excited to announce its prominent role at Ultra Facility 2024, with key presentations and roundtable discussions dedicated to advancing chemical cleanliness in the semiconductor industry. The event, taking place on October 30th, 2024, will feature Senior Applications Engineer Jikku Thomas and Senior Vice President of R&D Derek Oberreit, who lead a discussion on the importance of particle precursors in liquid chemicals.

As part of the extended high-purity chemicals agenda, Jikku Thomas, alongside Michael Walker & Derek Oberreit, will present the technical paper, “Aerosolization-based Particle and Particle Precursor Measurements in Sulfuric Acid and Hydrochloric Acid.” This presentation dives into the innovative applications of aerosolization to detect contaminants in these challenging process chemicals, a breakthrough aimed at enhancing contamination control in semiconductor materials.

“Kanomax FMT is thrilled to be at the forefront of advancements in high-purity chemical metrology,” Jikku Thomas shared. “We look forward to our metrology techniques enhancing cleanliness across the whole supply chain. Without metrology, there is no control.” Additionally, Derek Oberreit will lead a roundtable discussion titled “Particle Precursors 101”—an in-depth exploration of best practices for managing particle precursors in high-purity liquids. This discussion aims to foster a collaborative environment for industry leaders to share knowledge for the measurement of these yield-critical contaminants. Kanomax FMT is also eager to explore contributions from colleagues in PFAS metrology and organics measurements, reflecting the industry’s commitment to overcoming contamination challenges in high-purity chemicals.

As the partner, Winifred Int’l Technology Ltd. provides thorough supports of Kanomax FMT products to semiconductor industries in mainland China, Hong Kong, and Taiwan. Winifred has extensive experiences in using various metrologies to detect particles/precursor contaminants at airborne gases, UPW/process chemicals, slurry, filters, and surface of cleaned parts/equipment.